Recently, the physical mechanisms of the vacuum deposition method have achieved far more progress than that of the pyrolytic cracking method.
The thermal cracked carbon film resistors are going to be deprived of their position by those new film resistors such as metals, oxide-metals and nitrogen-metals which are produced by the so-called vacuum deposition method.
This report is concerned in the first place, with the influence that the manufacturing conditions of thermalcracked carbon film resistors gives to their constructions and characteristics, as observed as the result of the writer's experiments.
In the second place is introdued the manufacturing method of the cracked carbon films in the electrostatic field, and the characteristics of the film resistors obtained.