Microstructure Influence on Residual Stresses in Growing Chromia Oxide Films as Determined by In Situ High Temperature Raman Spectroscopy

Abstract:

In this work, growth stresses have been investigated in relation with the microstructure in the case of α-Cr2O3 growing oxide films on NiCr30 alloy. The equibiaxial growth stresses have been measured thanks to a technique coupling Raman spectroscopy and in situ high temperature oxidation of the NiCr30 alloy in the temperature range [700°C-900°C]. The low acquisition time necessary to obtain a Raman spectrum allows to follow the chromia growth kinetic with sufficient accuracy. It is demonstrated that the growth stress in such oxide films can attain more than 2 GPa, before additional thermal stress arises on cooling. Moreover, the growth stress kinetic - subsequent establishment and relaxation - are highly microstructure sensitive: in particular, as the oxidation temperature rises, the chromia grain size also increases, and it consequently retards the occurrence of the creep relaxation phenomena which needs an additional stress to start.