Deposition of a Well-Adherent Nano-Crystalline Diamond Coating on Titanium Using CH4-H2 Gas Mixture

Syed Jawid Askari; Fan Xiu Lu

doi:10.4028/www.scientific.net/MSF.561-565.1145

Paper Titles

Nano-Order Structural Analysis of White Light-Emitting Silicon Oxide Prepared by Successive Thermal Carbonization/Oxidation of the Porous Silicon
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Microstructure of Anisotropic Nd-Fe-B Film Magnets Prepared by Pulsed Laser Deposition
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An Actuator Laser of Optical Disk Drive High-Frequency Electromagnetic Vibrations Characteristic Analysis
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Structural, Electrical and Magnetic Properties of Ni₃₃Fe₆₇ and Ni₂₁Fe₇₉ Films Deposited on SiO₂/Si(100) at 633 K by DC Magnetron Co-Sputtering
p.1141

Deposition of a Well-Adherent Nano-Crystalline Diamond Coating on Titanium Using CH₄-H₂ Gas Mixture
p.1145

Nickel Metal Induced Lateral Crystallization of Patterned Amorphous Silicon Thin Film
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Preparation of Chain-Like Carbon Nano-Tubes Film and its Field Emission Properties
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Structural and Mechanical Properties of AlN Films by Pulsed Bias Arc Ion Plating
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Structural Evolution Upon Annealing of Multi-Layer Si/Fe Thin Films Prepared by Magnetron Sputtering
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HomeMaterials Science ForumMaterials Science Forum Vols. 561-565Deposition of a Well-Adherent Nano-Crystalline...

Deposition of a Well-Adherent Nano-Crystalline Diamond Coating on Titanium Using CH₄-H₂ Gas Mixture

Abstract:

The deposition of a well adherent diamond film on titanium and its alloys is always complicated due to the different thermal expansion coefficients of the two materials, the complex nature of the interlayer formed during diamond deposition, and the difficulty in achieving very high nucleation density. In this work well-adherent and smooth nano-crystalline diamond film was successfully deposited on pure titanium substrate by microwave plasma assisted chemical vapor deposition (MWPCVD) method in CH4/H2 environment. It is found that the average grain size was less than 20 nm with a surface roughness value as low as 28nm. Of particular interest in this study was the exceptional adhesion of approximately 2μm-thick diamond film to the metal substrate as observed by indentation testing up to 150 kg load. Experimental results on growth mechanism and obtaining good adhesion are discussed.

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Periodical:

Materials Science Forum (Volumes 561-565)

Pages:

1145-1148

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.561-565.1145

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Online since:

October 2007

Authors:

Syed Jawid Askari, Fan Xiu Lu

Keywords:

Adhesion, Microwave Chemical Vapor Deposition System, Nano-Crystalline Diamond Coating, Pure Ti Substrate

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