Fabrication of CoPt Nanodot Array with a Pitch of 33 nm Using Pattern-Transfer Technique of PS-PDMS Self-Assembly

Miftakhul Huda; Zulfakri bin Mohamad; Takuya Komori; You Yin; Sumio Hosaka

doi:10.4028/www.scientific.net/KEM.596.83

Paper Titles

Sintering of Copper Sub-Micron Particles by Heat and Atmospheric Pressure Non-Equilibrium Plasma Treatments
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Functional-Group-Retaining Polymerization of Hydroxyethyl Methacrylate by Atmospheric Pressure Non-Equilibrium Plasma
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Fabrication of 6-nm-Sized Nanodot Arrays with 12 nm-Pitch along Guide Lines Using both Self-Assembling and Electron Beam-Drawing for 5 Tbit/in² Magnetic Recording
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Ordering of Self-Assembled Nanodots Improved by Guide Pattern with Low Line Edge Roughness for 5 Tbit/in.² Patterned Media
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Fabrication of CoPt Nanodot Array with a Pitch of 33 nm Using Pattern-Transfer Technique of PS-PDMS Self-Assembly
p.83

Fabrication of Carbon Nanodot Arrays with a Pitch of 20 nm for Pattern-Transfer of PDMS Self-Assembled Nanodots
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Fabrication of 25-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Drawing, RIE and Ion-Milling
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Estimation of HSQ Resist Profile by Using High Contrast Developement Model for High Resolution EB Lithography
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Monte Carlo Simulation of Electron Trajectory in Solid for Electron Beam Lithography
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HomeKey Engineering MaterialsKey Engineering Materials Vol. 596Fabrication of CoPt Nanodot Array with a Pitch of...

Fabrication of CoPt Nanodot Array with a Pitch of 33 nm Using Pattern-Transfer Technique of PS-PDMS Self-Assembly

Abstract:

The progress of information technology has increased the demand of the capacity of storage media. Bit patterned media (BPM) has been known as a promising method to achieve the magnetic-data-storage capability of more than 1 Tb/in.². In this work, we demonstrated fabrication of magnetic nanodot array of CoPt with a pitch of 33 nm using a pattern-transfer method of block copolymer (BCP) self-assembly. Carbon hard mask (CHM) was adopted as a mask to pattern-transfer self-assembled nanodot array formed from poly (styrene)-b-poly (dimethyl siloxane) (PS-PDMS) with a molecular weight of 30,000-7,500 mol/g. According to our experiment results, CHM showed its high selectivity against CoPt in Ar ion milling. Therefore, this result boosted the potential of BCP self-assembly technique to fabricate magnetic nanodot array for the next generation of hard disk drive (HDD) due to the ease of large-area fabrication, and low cost.

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Periodical:

Key Engineering Materials (Volume 596)

Pages:

83-87

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.596.83

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Online since:

December 2013

Authors:

Miftakhul Huda, Zulfakri bin Mohamad, Takuya Komori, You Yin, Sumio Hosaka

Keywords:

Diblock Copolymer, Nanopatterning, Patterned Media, Pattern-Transfer, Self-Assembly

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