[1]
D. McIntyre, J.E. Greene, G. Håkansson, J.E. Sundgren W.D. Münz, J.: Appl. Phys. Vol. 67 (1990), p.1542.
Google Scholar
[2]
W. D. Sproul, M.E. Graham, M.S. Wong, P.J. Rudnik: Surf. Coat. Technol. Vol. 61 (1993), p.139.
Google Scholar
[3]
V. H. Derflinger, A. Schütze, M. Ante: Surf. Coat. Technol. Vol. 200 (2006), p.4693.
Google Scholar
[4]
S. Veprek, M. J.G. Veprek-Heijman: Surf. Coat. Technol. Vol. 202 (2008), p.5063.
Google Scholar
[5]
P. Holubar, M. Jilek, M. Sima: Surf. Coat. Technol. Vol. 120–121 (1999), p.184.
Google Scholar
[6]
S. Veprek, A. Niederhofer, K. Moto, T. Bolom, H.D. Mannling, P. Nesladek, et al.: Surf. Coat. Technol. Vol. 133–134 (2000), p.152.
Google Scholar
[7]
A. Niederhofer, P. Nesladek, H.D. Mannling, K. Moto, S. Veprek, M. Jilek: Surf. Coat. Technol. Vol. 120–121 (1999), p.173.
Google Scholar
[8]
S. Veprek, S. Reiprich, Li Shizhi: Appl. Phys. Lett. Vol. 66 (1995), p.2640.
Google Scholar
[9]
S. Zhang, D. Sun, Y. Fu, H. Du: Surf. Coat. Technol. Vol. 167 (2003), p.113.
Google Scholar
[10]
C. H. Zhang, X.C. Lu, H. Wang, J.B. Luo, Y.G. Shen, K.Y. Li: Appl. Surf. Sci. Vol. 252 (2006), p.6141.
Google Scholar
[11]
F. Vaz, L. Rebouta, S. Ramos, M.F. da Silva, J.C. Soares: Surf. Coat. Technol. Vol. 108–109 (1998), p.236.
Google Scholar
[12]
L. Rebouta, C.J. Tavares, R. Aimo, Z. Wang, K. Pischow, E. Alves et al.: Surf. Coat. Technol. Vol. 133–134 (2000), p.234.
Google Scholar
[13]
S. Ma, J. Prochazka, P. Karvankova, Q. Ma, X. Niu, X. Wang et al.: Surf. Coat. Technol. Vol. 194 (2005), p.143.
Google Scholar
[14]
I. W. Park, S.R. Choi, J.H. Suh, C.G. Park, K.H. Kim.: Thin Solid Films Vol. 447–448 (2004), p.443.
Google Scholar
[15]
Y.H. Cheng, T. Browne, B. Heckerman, E.I. Meletis: Surf. Coat. Technol. Vol. 204 (2010) p.2123.
Google Scholar
[16]
S. Veprek, H.D. Männling, M. Jilek, P. Holubar: Mater. Sci. Eng. A Vol. 366 (2004), p.202.
Google Scholar
[17]
M. Jilek, T. Cselle, P. Holubar, M. Morstein, M.G.J. Veprek-Heijman, S. Veprek: Plasma. Chem. Plasma Process. Vol. 24 (2004), p.493.
DOI: 10.1007/s11090-004-7929-3
Google Scholar
[18]
N. Jiang, Y.G. Shen, H.J. Zhang, S.N. Bao, X.Y. Hou: Mater. Sci. Eng. B Vol. 135 (2006), p.1.
Google Scholar
[19]
S. M. Yang, Y.Y. Chang, D.Y. Lin, D.Y. Wang, W. Wu: J. Nanosci. Nanotechnol. Vol. 8 (2008), p.2688.
Google Scholar
[20]
S. Veprek, R.F. Zhang, M.G.J. Veprek-Heijman, S.H. Sheng, A.S. Argon: Surf. Coat. Technol. Vol. 204 (2010), p.1898.
DOI: 10.1016/j.surfcoat.2009.09.033
Google Scholar
[21]
K. Lukaszkowicz, J. Sondor, A. Kriz, M. Pancielejko: J. Mater. Sci. Vol. 45 (2010), p.1629.
Google Scholar
[22]
M.G. Faga, G. Gautier, R. Calzavarini, M. Perucca, E. Aimo Boot, F. Cartasegna, L. Settineri: Wear Vol. 263 (2007), p.1306.
DOI: 10.1016/j.wear.2007.01.109
Google Scholar
[23]
Yin-Yu Chang, Sheng-Min Yang: Thin Solid Films Vol. 518 (2010) p. S34.
Google Scholar
[24]
PC Powder Diffraction Files, JCPDS-ICDD, (2000).
Google Scholar
[25]
B. Cullity, S. Stock, Elements of X-Ray Diffraction, 3rd ed., Prentice Hall, New Jersey, (2001).
Google Scholar
[26]
Y H Cheng, T Browne, B Heckerman, P Gannon, J C Jiang, E I Meletis, C Bowman and V Gorokhovsky: J. Phys. D: Appl. Phys. Vol. 42 (2009) 125415.
DOI: 10.1088/0022-3727/42/12/125415
Google Scholar
[27]
T. Suzuki et al.: J. Mat. Science, Vol. 35 (2000), p.4193.
Google Scholar
[28]
Sun Kyu Kim, Vinh Van Le: Thin Solid Films Vol. 518 (2010), p.7483.
Google Scholar
[29]
Handbook on Instrumented Indentation, CSM Instruments, ISO 9001.
Google Scholar
[30]
W. C. Oliver, G. M. Pharr: J. Mat. Res. Vol. 7 (1992), p.1564.
Google Scholar
[31]
P. J. Burnett, D. S. Rickerby: Thin Solid Films Vol. 137 (1988), p.233.
Google Scholar
[32]
D. S. Rickerby: Surf. Coat. Technol. Vol. 36 (1988), p.541.
Google Scholar
[33]
K. Dyrda, M. Sayer: Thin Solid Films Vols. 355-356 (1999), p.277.
Google Scholar