Highly Efficient Floating Field Rings for SiC Power Electronic Devices - A Systematic Experimental Study

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Abstract:

A systematic experimental study is conducted on floating field rings (FFR) incorporated into 4H-SiC junction barrier Schottky (JBS) diodes across four voltage ratings 650, 1200, 1700 and 3300V, in pursuit of highly efficient FFR designs. 30 designs of FFR in 3 categories are studied for each voltage rating, and the measured breakdown voltage (Vbr) of JBS divided by ring system width (W) is taken as the figure of merit (FOM) of each design. The influence of ring spacing, ring width and number of rings on Vbr is studied in detail. It is found that the initial ring spacing (S1) is critical in determining the highest Vbr achievable by a certain design, and its optimum value increases as voltage rating increases. TCAD simulation verifies the importance of S1. For designs with a small ring system width, subsequent ring spacing can also become important. Ring width does not have a definitive effect, and Vbr saturates beyond a certain ring number. The design with the highest Vbr may not render the highest FOM. Even style designs with appropriate ring spacings can be advantageous likely due to less susceptibility to variation of field oxide charge, and more tolerance to fabrication error, as well as ease of design.

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103-110

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Online since:

May 2023

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[1] E.M. Sankara Narayanan, O. Spulber, M. Sweet, J.V.S.C. Bose, et al., Progress in MOS controlled bipolar devices and edge termination technologies, Microelectronics Journal 35 (2004) 235–248.

DOI: 10.1016/s0026-2692(03)00186-1

Google Scholar

[2] B. J. Baliga, Fundamentals of Power Semiconductor Devices, 2nd ed., Springer, Switzerland, 2019, p.136.

Google Scholar

[3] Y.C. Kao, E. D. Wolley, High-voltage planar p-n junctions, Proceedings of the IEEE, 55(8) (1967) 1409-1414.

DOI: 10.1109/proc.1967.5842

Google Scholar

[4] B. J. Baliga, Fundamentals of Power Semiconductor Devices, 2nd ed., Springer, Switzerland, 2019, p.97.

Google Scholar

[5] T. Kimoto, J. A. Cooper, Fundamentals of Silicon Carbide Technology, John Wiley & Sons, Singapore, 2014, p.431.

Google Scholar

[6] B. J. Baliga, Fundamentals of Power Semiconductor Devices, 2nd ed., Springer, Switzerland, 2019, p.130.

Google Scholar