Correction: Panjan et al. Surface Topography of PVD Hard Coatings. Coatings 2021, 11, 1387
1
Jožef Stefan Institute, Jamova 39, 1000 Ljubljana, Slovenia
2
Jožef Stefan International Postgraduate School, Jamova 39, 1000 Ljubljana, Slovenia
*
Author to whom correspondence should be addressed.
Coatings 2023, 13(2), 435; https://doi.org/10.3390/coatings13020435
Submission received: 8 December 2022
/
Accepted: 13 February 2023
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Published: 15 February 2023
(This article belongs to the Special Issue Surface Topography Effects on Functional Properties of PVD Coatings)
Error in Table
The authors wish to make the following correction to this paper [1]:
In the row “average deposition rate” of Table 1 (page 5) the unit “nm/s” must be replaced with the unit “nm/min”. The corrected Table 1 appears below. The authors state that the scientific conclusions are unaffected. This correction was approved by the Academic Editor. The original publication has also been updated.
Reference
- Panjan, P.; Drnovšek, A.; Mahne, N.; Čekada, M.; Panjan, M. Surface Topography of PVD Hard Coatings. Coatings 2021, 11, 1387. [Google Scholar] [CrossRef]
Table 1.
Deposition methods and process parameters used for the preparation of PVD hard coatings. The deposition rates and ion current density are averages since all deposition techniques exhibited both spatial and temporal variations during a given deposition run as well as from one run to another run (depending on batching material).
Table 1.
Deposition methods and process parameters used for the preparation of PVD hard coatings. The deposition rates and ion current density are averages since all deposition techniques exhibited both spatial and temporal variations during a given deposition run as well as from one run to another run (depending on batching material).
| Deposition System | BAI 730 | CC800/7 | CC800/9 sinOx ML | AIPocket | |
|---|---|---|---|---|---|
| Preheating | Heating method | Electron bombardment | Infrared heating | Infrared heating | Infrared heating |
| Preheating temperature (°C) | 450 | 450 | 450 | 450 | |
| Etching | Etching mode | DC | RF | MF/booster | pulsed DC |
| Type of ions | Ar | Ar + Kr | Ar + Kr | Ar | |
| Negative substrate etching voltage (V) | 200 | 200 | 650/200 | 300/400 | |
| Etching time (min) | 15 | 85 + 55 ** | 15/60 | 45 | |
| Deposition | Deposition method | Low-voltage electron beam evaporation | Magnetron sputtering | Magnetron sputtering | Cathodic arc evaporation |
| Temperature (°C) | 450 | 450 | 450 | 450 | |
| Working gas | Ar + N2 | Ar + Kr + N2 | Ar + Kr + N2 | N2 | |
| Pressure of working gas (Pa) | 0.2 | 0.75 | 0.66 | 4 | |
| Deposition time (min) | 80 | 165 | 200 | 45 | |
| Negative substrate bias voltage (V) | 125 | 95 | 90 | 70 | |
| Average deposition rate * (nm/min) | 50 | 20 | 20 | 85 | |
| Average substrate current density (mA/cm2) | 3–5 | ~2 | ~2.5 | - |
* For twofold rotation of substrates, ** intermediate etching.
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MDPI and ACS Style
Panjan, P.; Drnovšek, A.; Mahne, N.; Čekada, M.; Panjan, M. Correction: Panjan et al. Surface Topography of PVD Hard Coatings. Coatings 2021, 11, 1387. Coatings 2023, 13, 435. https://doi.org/10.3390/coatings13020435
AMA Style
Panjan P, Drnovšek A, Mahne N, Čekada M, Panjan M. Correction: Panjan et al. Surface Topography of PVD Hard Coatings. Coatings 2021, 11, 1387. Coatings. 2023; 13(2):435. https://doi.org/10.3390/coatings13020435
Chicago/Turabian StylePanjan, Peter, Aljaž Drnovšek, Nastja Mahne, Miha Čekada, and Matjaž Panjan. 2023. "Correction: Panjan et al. Surface Topography of PVD Hard Coatings. Coatings 2021, 11, 1387" Coatings 13, no. 2: 435. https://doi.org/10.3390/coatings13020435
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