A new sputtering source (named SPT target) was modified to realize a high-rate deposition and continuous fabrication of Co-Cr composite perpendicular recording media. In order to improve orientation and crystallinity of Co-Cr layer and Permalloy backlayer, the aperture position was optimized and the magnetic return path plate was added to the target. The Co-Cr tape medium deposited on a 9μm thick polyimide film by using this modified sputtering source showed good high-density recording performance.