Fluorination Reaction Control by Surface Migration of Atomic Fluorine

N. S. Chilingarov; Чилингаров Н. С.; A. V. Knot’ko; Кнотько А. В.; A. Ya. Borschevsky; Борщевский А. Я.; L. N. Sidorov; Сидоров Л. Н.

doi:10.31857/S0044453723090030

Fluorination Reaction Control by Surface Migration of Atomic Fluorine

Authors: Chilingarov N.S.¹, Knot’ko A.V.², Borschevsky A.Y.¹, Sidorov L.N.¹
Affiliations:
1. Department of Chemistry, Lomonosov Moscow State University
2. Department of Material Sciences, Lomonosov Moscow State University
Issue: Vol 97, No 9 (2023)
Pages: 1343-1348
Section: ФИЗИЧЕСКАЯ ХИМИЯ ДИСПЕРСНЫХ СИСТЕМ И ПОВЕРХНОСТНЫХ ЯВЛЕНИЙ
URL: https://journals.rcsi.science/0044-4537/article/view/136672
DOI: https://doi.org/10.31857/S0044453723090030
EDN: https://elibrary.ru/XJHSVR
ID: 136672

Cite item

Full Text

Open Access
Restricted Access

Access granted
Restricted Access

Subscription Access

Abstract
About the authors
References
Supplementary files
Statistics

Abstract

Fluorination with atomic fluorine seems to be a promising way to functionalize materials, since such processes occur in a wide temperature range with an activation barrier close to zero. Here we demonstrate the ability to control the fluorination of platinum with atomic fluorine using surface migration (diffusion) of adsorbed fluorine atoms (Fads). A change in the concentration of fluorine atoms in the reaction zone is achieved by a change in the direction and magnitude of the diffusion flux of Fads due to the formation of alternative reaction zones. The occurrence of diffusion fluxes is determined by the area of contact of surfaces with the main and alternative reaction zones, which provide conductivity for Fads. The developed approach made it possible to experimentally establish the achievement of equilibrium in the reaction PtF4(g) + 2F(g) = PtF6(g) and measure the equilibrium constant.

Keywords

atomic fluorine, surface diffusion, electron microscopy, Knudsen cell mass-spectrometry

References

Weinstock B., Malm J.G., Weaver E.E. // J. Amer. Chem. Soc. 1961. P. 4310.
Jones W.E., Scolnik E.G. // Chem. Rev. 1976. P. 563.
Безмельницин В.Н., Легасов В.А., Чайванов B.B. // Докл. акад. наук СССР. 1977. Т. 235. С. 96.
Feng W., Long P., Feng Y. et al. // Adv. Sci. 2016. V. 3. P. 1500413.
Alimi Ar.R., Gerber R.B., Apkarian V.A. // J. Chem. Phys. 1990. V. 92. P. 3551.
Feld J., Kunttu H., Apkarian V.A. // Ibid. 1990. V. 93. P. 1009.
Misochko E.Ya., Akimov A.V., Wight C.A. // Chem. Phys. Lett. 1997. V. 274. P. 23.
Misochko E.Ya., Akimov A.V., Wight C.A. // J. Phys. Chem. A. 1999. V. 103. P. 7972.
Chilingarov N.S., Knot’ko A.V., Shlyapnikov I.M. et al. // Ibid. 2015. V. 119. P. 8452.
Chilingarov N.S., Borschevsky A.Ya., Romanovsky B.V. et al. // J. Phys. Chem. C. 2018. V. 122. P. 26372.
Chilingarov N.S., Rau J.V., Sidorov L.N. et al. // J. Fluorine Chem. A. 2000. V. 104. P. 291.
Чилингаров Н.С., Рау Д.В., Никитин А.В. и др. // Журн. физ. химии. 1997. Т. 71. С. 1455.
Tressaud A., Pintchovski F., Lozano L. et al. // Mat. Res. Bull. 1976. V. 11. P. 689.
Чилингаров Н.С., Скокан Е.В., Рау Д.В. и др. // Журн. физ. химии. 1992. Т. 66. С. 1127.
Drowart J., Chattilon C., Hastie J. et al. // Pure Appl. Chem. 2005. V. 77. P. 683.
Гурвич Л.В. // Вестн. АН СССР. 1983. № 3. С. 54.