Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
ISSN-L : 1882-2398
技術資料
大型ガラス基板へのスパッタリング装置の発展と新技術
新井 真佐藤 善勝清田 淳也佐藤 重光
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2011 年 54 巻 2 号 p. 92-96

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  ULVAC has maintained a leading share in the market of sputtering deposition systems for liquid crystal display (LCD) production since 1990, when LCD market started its rapid growth. These systems are used to prepare TFT-array and transparent conductive oxide (TCO) layers in LCD. This document describes the features of our sputtering system and especially focuses on the change in design concept of the system at the Gen. 7 substrate which aimed to achieve the demands for “Simple, Small-footprint and high-productivity”. A total package we propose for the sputtering deposition production, including the target material supply and the system maintenance, is also presented. Finally, recently proposed new materials for TFT are introduced: IGZO, a high mobility TCO material, and Cu alloys for low resistivity wiring.

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© 2011 一般社団法人日本真空学会
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