Influence Annealing Process on Structural and Optical Properties of SnS Thin Films
DOI:
https://doi.org/10.31257/2018/JKP/2023/v15.i02.12262Keywords:
Tin Sulfide, Thermal Evaporation, AnnealingAbstract
Thin film technology has helped offer an understanding of the crystalline structure of substances, further to the characteristics of electronic transitions and how they are used effectively in different applications. This research focused on the effect of the process of annealing on the structural and optical characteristics of tin sulfide (SnS) thin films. The technique of thermal evaporation was used to synthesize the film samples under a vacuum of about 10–7 mbar. The coated SnS thin films were annealed at 200 °C and the structural and optical characteristics parameters, such as absorbance and transmittance, as well as optical bandgap and band-tail energies in the range )300–1150( nm, were discussed. Under the influence of the annealing process, the average crystal size changed from 14 nm to 11 nm. The energy gap value increased from 1.53 eV to 1.85 eV, while Urbach energy was seen to reduce from 0.913 eV for fabricated samples to be 0.824 eV after the annealing process.
Downloads
Downloads
Published
How to Cite
Issue
Section
Categories
License
Copyright (c) 2023 Inass Abdulah Zgair, Abdulazeez O. Mousa Al-Ogaili, Khalid Haneen Abass
This work is licensed under a Creative Commons Attribution 4.0 International License.
Journal of Kufa-Physics is licensed under the Creative Commons Attribution 4.0 International License, which allows users to copy, to create extracts, abstracts, and new works from the Article, to alter and revise the Article, and to make commercial use of the Article (including reuse and/or resale of the Article by commercial entities), provided the user gives appropriate credit (with a link to the formal publication through the relevant DOI), provides a link to the license, indicates if changes were made and the licensor is not represented as endorsing the use made of the work. The authors hold the copyright for their published work on the JKP website, while KJP is responsible for appreciating citation for their work, which is released under CC-BY-4.0 enabling the unrestricted use, distribution, and reproduction of an article in any medium, provided that the original work is properly cited.
