Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Synthesis of 2,6-dihydroxymethyl-4-methyl phenol and Its Application in Novolac Resins
Jinrui YangJuncheng CongPeijun CongShangxian Yu
Author information
JOURNAL FREE ACCESS

2014 Volume 27 Issue 4 Pages 545-551

Details
Abstract

DEPT135 was used to study the hydroxymethylation of p-cresol in basic condition. The roles of type and amount of catalyst, reaction temperature, reaction time were investigated to optimize reaction conditions for the synthesis of 2,6-dihydroxymethyl-4-methyl phenol(2,6-DHMMP). Subsequently, a series of novolac resins with extremely high or low MW, narrow MW/MN, as well as alternating co-condensation structure have been produced by the condensation of 2,6-DHMMP and phenol, m-cresol etc. The synthesized p-cresol/phenol resin has a MW of 20000-30000, and MW/MN of 15-20, and also excellent resistance to alcohol and alkali, which meet the needs of photosensitive compositions. The synthesized p-/m-cresol resin has a MW of 25000, and MW/MN of below 15, as well as well resistance to alkali, heat and etching. These novolac resins have good prospects in terms of resist and printing plates.

Content from these authors
© 2014 The Society of Photopolymer Science and Technology (SPST)
Previous article
feedback
Top