Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Meniscus Analysis in Micro Gap during Liquid Drying Process
Atsushi IshikawaMakoto SakataAkira Kawai
Author information
JOURNAL FREE ACCESS

2004 Volume 17 Issue 3 Pages 457-460

Details
Abstract

The drying process of the rinse water affects strongly to pattern collapse phenomena during development process. In order to analyze the water meniscus behavior, a PET film is used as a parallel line pattern. By using this transparent pattern, wetting behavior of water meniscus between two patterns can be observed. In the drying process of water meniscus, it is clearly observed that the meniscus enters from the side edge of the parallel pattern. The meniscus behavior can be analyzed based on capillary rise and gravity.

Content from these authors
© 2004 The Society of Photopolymer Science and Technology (SPST)
Previous article Next article
feedback
Top