精密工学会誌
Online ISSN : 1882-675X
Print ISSN : 0912-0289
ISSN-L : 0912-0289
Si表面上におけるハロゲン含有ガス分子の熱分解過程
土屋 八郎後藤 英和森 勇蔵広瀬 喜久治宮崎 真安田 光宏植松 克彰
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1989 年 55 巻 8 号 p. 1475-1480

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The mechanisms and the characteristics of a pyrolytic process of halogen-containing gases are investigated theoretically and experimentally. A calculation method of analyzing chemical reactions on solid surfaces is proposed. The dissociation process of Cl2 and SF6 gas moleculeon a Si (100) surface is investigated by calculating the local energy of the molecule, and a model of the pyrolytic process is proposed. It is confirmed that the dissociation energy of the molecule decreases due to a specific process on the solid surface which can not operate on the oxidized Si surface, and that the dissociation process of CF4 gas molecule is promoted by oxygen gas molecule.

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