年次大会講演論文集
Online ISSN : 2433-1325
セッションID: 903
会議情報
903 高度な顎堤吸収を持つ下顎両側性遊離端義歯・支台歯とその周辺組織のインプラント支持による荷重伝達特性(J04-1 臨床医歯学における非・低侵襲計測技術の展開(1) 歯科・整形外科における計測および生体シミュレーション,ジョイントセッション,21世紀地球環境革命の機械工学:人・マイクロナノ・エネルギー・環境)
伊藤 秀美Angelo. A. CAPUTO佐々木 具文佐藤 美次男中原 寛子
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The purpose of this study was to photoelastically compare the load transfer characteristics of a distal extension RPD with implant assisted support in the posterior of a mandible with an atrophic edentulous ridge. The model included the anterior teeth and the first premolars bilaterally. Threaded implants, 3.75mm diameter 7mm length, were embedded 20mm distal to the first premolars on the posterior edentulous ridges. I-bar partial dentures with mesial rests were fabricated and physiologically adjusted to the models. The implant support conditions tested were healing abutments and 3mm ball attachments. Simulated vertical and lateral occlusal loads were applied at the first molar position and the stress developed in the abutment teeth were monitored photoelastically. Posterior implants with both healing abutment and ball attachments in the posterior of a mandible tended to assist support of a distal extension RPD and produce only low level stresses in the supporting atrophic edentulous ridge.

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