Novel Methodology for Assessing Chip-Package Interaction Effects onChip Performance

The paper presents a multiscale simulation methodology and EDA tool that assesses the effect of thermal mechanical stresses arising after die assembly on chip performance. Existing non uniformities of feature geometries and composite nature of on-chip interconnect layers are addressed by developed methodology of the anisotropic effective thermomechanical material properties (EMP) that reduces complexity of FEA simulations and enhances the accuracy and performance. Physical nature of the calculated EMP makes it scalable with the simulation grid size, which enables resolution of stress/strain at different scales from package to device channel. With feature-scale resolution, the tool enables accurate calculation of stress components in the active region of each device, where the carrier mobility variation results in deviations of circuits performance. The tool's capability of back-annotation of the hierarchic Spice netlist with the stress values allows a user to perform circuit simulation in different stress environments, by placing the circuit block in different locations in the layout characterized by different distances from the stress sources, such as die edges and C4 bumps. Both schematic and post-layout netlists can be employed for finding optimal floorplan minimizing the stress impact at early design stages, as well as for the final design sign-off. Electrical measurements on a specially designed test-package were used for validation of the methodology. Good agreement between measured and simulated variations of device characteristics has been demonstrated.