Transform designs to chips, an end user point of view on mask making

John Y. Chen

doi:10.1117/12.981267

8 November 2012 Transform designs to chips, an end user point of view on mask making

John Y. Chen

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Proceedings Volume 8522, Photomask Technology 2012; 852202 (2012) https://doi.org/10.1117/12.981267
Event: SPIE Photomask Technology, 2012, Monterey, California, United States

Abstract

Mask is a tool required to replicate a set of complicated IC geometries numerous times producing chips in large volume. It is absolutely crucial to achieve high quality mask in accuracy and perfection. This paper focuses on technology needs which challenge mask-making capabilities including data preparation and Optical Proximity Correction (OPC), Critical Dimension (CD) / Line Edge Roughness (LER) control, alignment and defect elimination. The impact of lithography and mask making on the design and manufacturing of new products is discussed from an end user perspective. The paper emphasizes performance, precision and perfection and the necessity of the three p’s for the continuation of Moore’s law.

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John Y. Chen "Transform designs to chips, an end user point of view on mask making", Proc. SPIE 8522, Photomask Technology 2012, 852202 (8 November 2012); https://doi.org/10.1117/12.981267

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