Paper
28 May 1980 Measurements Of Small Dimensions Of Products And By-Products
Dennis A. Swyt, Stephen W. Jensen
Author Affiliations +
Proceedings Volume 0220, Optics in Metrology and Quality Assurance; (1980) https://doi.org/10.1117/12.958577
Event: 1980 Los Angeles Technical Symposium, 1980, Los Angeles, United States
Abstract
Direct-imaging and plane-projection instruments are mainstays for definitive calibration-quality measurements of small dimensions for industrial and clinical applications. Light-and electron-optical techniques span six orders of sizes, from millimeters through micrometers down to nanometers. A common assumption is that, above the resolution limit of a device, accurate measurements can be made based on the geometric optic relation of image size xi to object size xo: xi = Mx0, where M is the scalar magnification of the device. However, in measurements of lengths, widths or diameters, the relation fails long before the resolution limit of the device is approached. As a result, substantial systematic errors in dimensional measurements occur in industrial applications from particle sizing to photomask metrology. The causes of such difficulties and the techniques to overcome them are discussed in the context of work at the National Bureau of Standards (NBS) on the development of SEM and optical techniques for accurate measurements in the range 0.1 to 100 μm.
© (1980) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dennis A. Swyt and Stephen W. Jensen "Measurements Of Small Dimensions Of Products And By-Products", Proc. SPIE 0220, Optics in Metrology and Quality Assurance, (28 May 1980); https://doi.org/10.1117/12.958577
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KEYWORDS
Calibration

Optical microscopes

Particles

Scanning electron microscopy

Image processing

Transmission electron microscopy

Image quality

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