Reaction kinetics of non-reciprocal photo-base generator (NRPBG) patterning

D. Shykind; R. Bristol; J. Roberts; J. Blackwell; Y. Borodovsky

doi:10.1117/12.846990

30 March 2010 Reaction kinetics of non-reciprocal photo-base generator (NRPBG) patterning

D. Shykind, R. Bristol, J. Roberts, J. Blackwell, Y. Borodovsky

Proceedings Volume 7639, Advances in Resist Materials and Processing Technology XXVII; 76391Y (2010) https://doi.org/10.1117/12.846990
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

We present a simple reaction rate analysis of lithographic patterning using the Non-Reciprocal Photo Base Generation (NRPBG) scheme of Bristol (Bristol, et. al., to be published in Proceedings of the SPIE - The International Society for Optical Engineering, 2010, presentation 7639-4). Multistep reaction kinetics simulations demonstrate that the NRPBG scheme produces clear pitch division upon 193 nm double-exposure, over a range of photochemical reaction rate constants.

Citation Download Citation

D. Shykind, R. Bristol, J. Roberts, J. Blackwell, and Y. Borodovsky "Reaction kinetics of non-reciprocal photo-base generator (NRPBG) patterning", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76391Y (30 March 2010); https://doi.org/10.1117/12.846990

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