Rapid fabrication of large area photonic crystals containing arbitrary defects by combining the interference and multi-photon polymerization techniques

Ngoc Diep Lai; Wen Ping Liang; Jian Hung Lin; Chia Chen Hsu

doi:10.1117/12.614821

26 August 2005 Rapid fabrication of large area photonic crystals containing arbitrary defects by combining the interference and multi-photon polymerization techniques

Ngoc Diep Lai, Wen Ping Liang, Jian Hung Lin, Chia Chen Hsu

Author Affiliations +

Proceedings Volume 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II; 593108 (2005) https://doi.org/10.1117/12.614821
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

We demonstrate a promising method to fabricate large-area photonic crystals with desired defects by using the combination of interference and multi-photon polymerization techniques. Multiple-exposure of two-beam interference pattern at 325 nm into a negative SU-8 photopolymerizable photoresist is used to form a square or hexagonal twodimensional periodic structure. Arbitrary defects are introduced in these structures by tightly focused (numerical aperture 0.85) 100 fs duration pulses at 830 nm to generate multi-photon polymerization effect. The experimental evidence of 6 mm × 6 mm photonic crystals with the lattice constant as small as 1 μm embedding several kinds of defect proves the concept and shows this technique potentially useful for photonic researches and applications.

Citation Download Citation

Ngoc Diep Lai, Wen Ping Liang, Jian Hung Lin, and Chia Chen Hsu "Rapid fabrication of large area photonic crystals containing arbitrary defects by combining the interference and multi-photon polymerization techniques", Proc. SPIE 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II, 593108 (26 August 2005); https://doi.org/10.1117/12.614821

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