Illumination optimization via multifunction approximation

Thomas G. Kuper

doi:10.1117/12.485325

16 June 2003 Illumination optimization via multifunction approximation

Thomas G. Kuper

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.485325
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Progress toward a new method for performing design optimization of second-generation illuminator optics is described. The method involves constructing a function that approximates the figure of merit over a finite volume of solution space. This approximating function can be evaluated much more efficiently than the actual merit function, and can also be used to compute analytic values for the first and second derivatives. Optimization, subject to the imposition of nonlinear constraints, is achieved by incorporating the approximating function into an existing damped least squares optimizer. When this work is complete, the smoothing nature of the approximation will permit the optimization of noisy merit functions (e.g., Monte Carlo illumination simulations using limited numbers of rays).

Citation Download Citation

Thomas G. Kuper "Illumination optimization via multifunction approximation", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.485325

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