Paper
10 August 2000 Microsystems for diverse applications using recently developed microfabrication techniques
Laurent Dellmann, Terunobu Akiyama, Danick Briand, Sebastien Gautsch, Olivier T. Guenat, Benedikt Guldimann, Philippe Luginbuhl, Cornel Marxer, Urs Staufer, Bart van der Schoot, Nico F. de Rooij
Author Affiliations +
Proceedings Volume 4180, MEMS Reliability for Critical Applications; (2000) https://doi.org/10.1117/12.395706
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States
Abstract
The continuous progress in micro- and nano-system technologies has allowed the successful development of many innovative products in process control, environmental monitoring, healthcare, automotive and aerospace as well as information processing systems. In this paper on overview will be given of current progress in micro- and nanofabrication process technologies, such as deep reactive ion etching, micro-electro discharge machining, thick photoresistant processing and plating. The availibility of these micro- and nanofabrication processes will be illustrated with examples of new generations of silicon-based sensors, actuators and Microsystems with a particular emphasis on real applications of these components and systems.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Laurent Dellmann, Terunobu Akiyama, Danick Briand, Sebastien Gautsch, Olivier T. Guenat, Benedikt Guldimann, Philippe Luginbuhl, Cornel Marxer, Urs Staufer, Bart van der Schoot, and Nico F. de Rooij "Microsystems for diverse applications using recently developed microfabrication techniques", Proc. SPIE 4180, MEMS Reliability for Critical Applications, (10 August 2000); https://doi.org/10.1117/12.395706
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KEYWORDS
Silicon

Actuators

Sensors

Field effect transistors

Gas sensors

Microfabrication

Atomic force microscopy

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