Use of novel photoresists in the production of submillimeter-wave integrated circuits

Chris Collins; Robert E. Miles; G. M. Parkhurst; John W. Digby; H. Kazemi; J. Martyn Chamberlain; R. D. Pollard; N. J. Cronin; Steven R. Davies; John W. Bowen; David Paul Steenson

doi:10.1117/12.331184

13 November 1998 Use of novel photoresists in the production of submillimeter-wave integrated circuits

Chris Collins, Robert E. Miles, G. M. Parkhurst, John W. Digby, H. Kazemi, J. Martyn Chamberlain, R. D. Pollard, N. J. Cronin, Steven R. Davies, John W. Bowen, David Paul Steenson

Author Affiliations +

Proceedings Volume 3465, Millimeter and Submillimeter Waves IV; (1998) https://doi.org/10.1117/12.331184
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

A new technique is reported for micro-machining millimeter and submillimeter-wave rectangular waveguide components using an advanced thick film UV photoresist known as EPON^TM SU-8. The recent introduction of this resist has been of great interest to the millimeter-wave and terahertz micro-machining communities, as it is capable of producing features up to 1 mm in height with very high aspect ratios in only a single UV exposure. It therefore represents a possible low-cost alternative to the LIGA process. S-parameter measurements on the new rectangular waveguides show that they achieve lower loss than those produced using other on-chip fabrication techniques, they have highly accurate dimensions, are physically robust, and cheap and easy to manufacture.

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Chris Collins, Robert E. Miles, G. M. Parkhurst, John W. Digby, H. Kazemi, J. Martyn Chamberlain, R. D. Pollard, N. J. Cronin, Steven R. Davies, John W. Bowen, and David Paul Steenson "Use of novel photoresists in the production of submillimeter-wave integrated circuits", Proc. SPIE 3465, Millimeter and Submillimeter Waves IV, (13 November 1998); https://doi.org/10.1117/12.331184

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