Development of an integrated 3D lithography simulator

Choong-Ki Seo; Seung-Gol Lee; Jong-Ung Lee

doi:10.1117/12.310810

29 June 1998 Development of an integrated 3D lithography simulator

Choong-Ki Seo, Seung-Gol Lee, Jong-Ung Lee

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310810
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

We have developed our own three-dimensional optical lithography simulator, LG-OLiS (LG-Optical Lithography Simulator), which can be applied to both the 2-D and the 3-D non-planar cases. It includes with all processes of optical lithography such as the formation of an aerial image, the exposure, the post-exposure bake (PEB), and the development processes. Several kinds of numerical methods are adopted for numerical implementation and the simulation of an aerial image and the exposure process are based on both the approximate theory and the rigorous theory. Therefore, our LG-OLiS can simulate the topological case efficiently nd exactly.

Citation Download Citation

Choong-Ki Seo, Seung-Gol Lee, and Jong-Ung Lee "Development of an integrated 3D lithography simulator", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310810

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