Marathon damage testing of pellicles for 193-nm lithography

Andrew Grenville; Vladimir Liberman; Roderick R. Kunz; Mordechai Rothschild; Jan H. C. Sedlacek; Ray S. Uttaro

doi:10.1117/12.301218

12 February 1997 Marathon damage testing of pellicles for 193-nm lithography

Andrew Grenville, Vladimir Liberman, Roderick R. Kunz, Mordechai Rothschild, Jan H. C. Sedlacek, Ray S. Uttaro

Proceedings Volume 3236, 17th Annual BACUS Symposium on Photomask Technology and Management; (1997) https://doi.org/10.1117/12.301218
Event: 17th Annual BACUS Photomask Technology and Management, 1997, Redwood City, CA, United States

Abstract

We investigate the effect of 193-nm radiation on commercially available pellicles for 248-nm lithography. Pellicles from two suppliers were irradiated at a realistic reticle plane fluence (0.1 mJ/cm²/pulse) for 50 million pulses. Analysis of transmission spectra revealed loss of pellicle material, decreased refractive index and increased absorption in various combinations depending on pellicle type and ambient. Although one of the two materials may be suitable for use at 193 nm, the other showed unacceptable degradation. We also quantified outgassing rates of organic species during irradiation, and observed greatly accelerated material loss in a pure nitrogen ambient compared with air. Yield rates of perfluorinated fragments and polymer product exhibited two-photon scaling behavior.

Citation Download Citation

Andrew Grenville, Vladimir Liberman, Roderick R. Kunz, Mordechai Rothschild, Jan H. C. Sedlacek, and Ray S. Uttaro "Marathon damage testing of pellicles for 193-nm lithography", Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); https://doi.org/10.1117/12.301218

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