Non-PFAS biomass EUV resist for sustainable semiconductor manufacturing

Kazuyo Morita

doi:10.1117/12.3010636

9 April 2024 Non-PFAS biomass EUV resist for sustainable semiconductor manufacturing

Kazuyo Morita

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 1295718 (2024) https://doi.org/10.1117/12.3010636
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

A non-PFAS biomass EUV resist is proposed as a sustainable material for reducing PFAS and CO₂ emissions. It was demonstrated that HP 8nm L/S pattern formation with a non-PFAS biomass EUV resist for beyond 2nm node. Furthermore, biomass developer and rinse for non-PFAS biomass EUV resists are proposed to improve biomass content. This proves that the non-PFAS biomass EUV resist can be used in high-NA EUV lithography at 8nm.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Kazuyo Morita "Non-PFAS biomass EUV resist for sustainable semiconductor manufacturing", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 1295718 (9 April 2024); https://doi.org/10.1117/12.3010636

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available