Realization of high-Q Lamb wave resonator with smooth vertical etching profile for thin film lithium niobate

Arjun Aryal; Ravi Kiran Chityala; Isaac Stricklin; Sidhant Tiwari; Aleem Siddiqui; Tito Busani

doi:10.1117/12.2665860

30 April 2023 Realization of high-Q Lamb wave resonator with smooth vertical etching profile for thin film lithium niobate

Arjun Aryal, Ravi Kiran Chityala, Isaac Stricklin, Sidhant Tiwari, Aleem Siddiqui, Tito Busani

Author Affiliations +

Proceedings Volume 12497, Novel Patterning Technologies 2023; 124970X (2023) https://doi.org/10.1117/12.2665860
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Conference Poster

Abstract

In this work, Lamb Wave Resonators (LWRs) based on 2 μm thin Y-cut LiNbO3 films have been fabricated using integrated fabrication process that defines IDTs (Inter Digital Transducers) on top surface and a partial Si cavity for a sacrificial layer on the bottom surface. We discuss the etch quality and its effects on the device's performance. For the first time, we present an optimized high-quality etched MEMS (Micro-electromechanical Systems) Resonator with smooth and vertical sidewalls on this material system, reporting the maximum Q-factor of 2500 at 846 MHz frequency. We observed that the resonator system has a Q-factor of 480 over the same frequency range when the etched surface has significant roughness and non-verticality. Q values of the device are greatly diminished by the presence of surface roughness and non-verticality of the etched edges. This truly highlights how important it is to have a high-quality etch profile for a piezoelectric material system like this so that the designed resonators can perform at their best.

Citation Download Citation

Arjun Aryal, Ravi Kiran Chityala, Isaac Stricklin, Sidhant Tiwari, Aleem Siddiqui, and Tito Busani "Realization of high-Q Lamb wave resonator with smooth vertical etching profile for thin film lithium niobate", Proc. SPIE 12497, Novel Patterning Technologies 2023, 124970X (30 April 2023); https://doi.org/10.1117/12.2665860

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