Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication

A. Schleunitz; C. Schuster; A. Voigt; M. Russew; M. Lohse; M. Heinrich; G. Grützner

doi:10.1117/12.2661531

30 April 2023 Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication

A. Schleunitz, C. Schuster, A. Voigt, M. Russew, M. Lohse, M. Heinrich, G. Grützner

Proceedings Volume 12497, Novel Patterning Technologies 2023; 124970V (2023) https://doi.org/10.1117/12.2661531
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Conference Poster

Abstract

The ongoing advancement of lithographic manufacturing in micro- and nanopatterning rely on the commercial availability of innovative photoresists, polymers and photopolymers as well as complementary process chemicals: This allows to enhance current micro- and nanofabrication technologies by increasing the overall pattern complexity or general process simplicity. In this contribution, we demonstrate that material innovations have a significant part in enhancing micro- and nanofabrication by outperforming generic photoresists through cross-functionality as it is increasingly required in ever growing pattern complexity (e.g. advanced mix-and-match methods) or when additional material features are set by the final application.

Citation Download Citation

A. Schleunitz, C. Schuster, A. Voigt, M. Russew, M. Lohse, M. Heinrich, and G. Grützner "Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication", Proc. SPIE 12497, Novel Patterning Technologies 2023, 124970V (30 April 2023); https://doi.org/10.1117/12.2661531

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