Small target compatible dimensional and analytical metrology for semiconductor nanostructures using x-ray fluorescence techniques

Philipp Hönicke; Yves Kayser; Victor Soltwisch; Andre Wählisch; Nils Wauschkuhn; Jeroen E. Scheerder; Claudia Fleischmann; Janusz Bogdanowicz; Anne-Laure Charley; Anabela Veloso; Roger Loo; Hans Mertens; Andriy Hikavyy; Thomas Siefke; Anna Andrle; Grzegorz Gwalt; Frank Siewert; Richard Ciesielski; Burkhard Beckhoff

doi:10.1117/12.2657963

27 April 2023 Small target compatible dimensional and analytical metrology for semiconductor nanostructures using x-ray fluorescence techniques

Philipp Hönicke, Yves Kayser, Victor Soltwisch, Andre Wählisch, Nils Wauschkuhn, Jeroen E. Scheerder, Claudia Fleischmann, Janusz Bogdanowicz, Anne-Laure Charley, Anabela Veloso, Roger Loo, Hans Mertens, Andriy Hikavyy, Thomas Siefke, Anna Andrle, Grzegorz Gwalt, Frank Siewert, Richard Ciesielski, Burkhard Beckhoff

Author Affiliations +

Proceedings Volume 12496, Metrology, Inspection, and Process Control XXXVII; 124961J (2023) https://doi.org/10.1117/12.2657963
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

X-ray fluorescence techniques in special operation modes can provide valuable quantitative insights for semiconductor related applications and can be made compatible to typical sizes of homogeneously structured metrology pads. As their dimensions are usually in the order of several 10 μm per direction, it must be ensured that no adjacent regions are irradiated or that no x-ray fluorescence radiation from adjacent areas reaches the detector. As this can be realized by using small excitation beams, a multitude of information can be retrieved from such XRF data. In addition to elemental composition, including sensitivity to sub-surface features, one can derive quantitative amounts of material and even dimensional properties of the nanostructures under study. Here, we show three different approaches for studies related to semiconductor applications that are capable to be performed on real world dies with commonly sized metrology pads.

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Philipp Hönicke, Yves Kayser, Victor Soltwisch, Andre Wählisch, Nils Wauschkuhn, Jeroen E. Scheerder, Claudia Fleischmann, Janusz Bogdanowicz, Anne-Laure Charley, Anabela Veloso, Roger Loo, Hans Mertens, Andriy Hikavyy, Thomas Siefke, Anna Andrle, Grzegorz Gwalt, Frank Siewert, Richard Ciesielski, and Burkhard Beckhoff "Small target compatible dimensional and analytical metrology for semiconductor nanostructures using x-ray fluorescence techniques", Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 124961J (27 April 2023); https://doi.org/10.1117/12.2657963

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