Presentation + Paper
24 May 2022 CMOS compatible design of photonic nanojet
Aneesh Vincent Veluthandath, Ganapathy Senthil Murugan
Author Affiliations +
Abstract
PNJs are non-resonant travelling beams with applications in enhanced Raman scattering, coupled resonator optical waveguide, high resolution microscopy, lithography and nonlinear optics. The length and beam width of the PNJ can be controlled by engineering the shape of the dielectric structure as well as by changing the refractive index contrast between the particle and the surrounding medium. The waist of PNJ moves towards the diffracting particle with increase in refractive index, and for refractive indices higher than 2, the waist is inside the particle. This migration of beam waist towards the interior of the particle is the biggest hurdle in on chip PNJ generation, because many CMOS compatible materials, including Silicon has refractive index higher than 2. In this study, we present the design and computational results of a photonic chip made of Silicon that can support PNJ outside the material boundary. We have studied the characteristics of PNJ including the width and length as well as the effect of surrounding medium.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Aneesh Vincent Veluthandath and Ganapathy Senthil Murugan "CMOS compatible design of photonic nanojet", Proc. SPIE 12152, Mesophotonics: Physics and Systems at Mesoscale, 1215203 (24 May 2022); https://doi.org/10.1117/12.2624336
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KEYWORDS
Refractive index

Silicon

Particles

Photonic nanostructures

Finite element methods

Lithography

Silicon photonics

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