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16 August 2021 A general stress patterning method for manufacturing ultra-precise free-form deformation in thin-substrates (Conference Presentation) (Withdrawal Notice)
Youwei Yao, Brandon Chalifoux, Ralf Heilmann, Mark Schattenburg
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Proceedings Volume 11822, Optics for EUV, X-Ray, and Gamma-Ray Astronomy X; 118220W (2021) https://doi.org/10.1117/12.2595537
Event: SPIE Optical Engineering + Applications, 2021, San Diego, California, United States
Abstract
Publisher’s Note: This conference presentation, originally published on 5 August 2021 was withdrawn on 13 August 2021 per author request.
Yao, Chalifoux, Heilmann, and Schattenburg: A general stress patterning method for manufacturing ultraprecise free-form deformation in thin-substrates (Withdrawal Notice)
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Youwei Yao, Brandon Chalifoux, Ralf Heilmann, and Mark Schattenburg "A general stress patterning method for manufacturing ultra-precise free-form deformation in thin-substrates (Conference Presentation) (Withdrawal Notice)", Proc. SPIE 11822, Optics for EUV, X-Ray, and Gamma-Ray Astronomy X, 118220W (16 August 2021); https://doi.org/10.1117/12.2595537
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KEYWORDS
Optical lithography
X-ray optics
Manufacturing
Optics manufacturing
Astronomical imaging
EUV optics
Extreme ultraviolet
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