Increased OPC modeling accuracy of deformation effects in positive-tone development photoresists

Folarin Latinwo; Yulu Chen; Delian Yang; Rob DeLancey; Owen Huang; Kevin Lucas

doi:10.1117/12.2584781

22 February 2021 Increased OPC modeling accuracy of deformation effects in positive-tone development photoresists

Folarin Latinwo, Yulu Chen, Delian Yang, Rob DeLancey, Owen Huang, Kevin Lucas

Proceedings Volume 11613, Optical Microlithography XXXIV; 116130F (2021) https://doi.org/10.1117/12.2584781
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

PTD photoresists are still the main type of photoresists used for tight pitch layers in advanced patterning. Recent experimental results show evidence that the same mechanical deformation behaviors seen in NTD photoresist process also exist in PTD photoresist processes. These PTD photoresist deformation behaviors cause CD differences which significantly impact CD control budgets in modern technology nodes. Therefore, there is a strong need to accurately model PTD photoresist deformation effects in compact OPC models. In this paper we discuss the polymer physics relevant to physical deformation in PTD photoresists in comparison to NTD photoresists

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Citation Download Citation

Folarin Latinwo, Yulu Chen, Delian Yang, Rob DeLancey, Owen Huang, and Kevin Lucas "Increased OPC modeling accuracy of deformation effects in positive-tone development photoresists", Proc. SPIE 11613, Optical Microlithography XXXIV, 116130F (22 February 2021); https://doi.org/10.1117/12.2584781

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