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Captive and merchant mask makers participated in an anonymous survey in the summer of 2020, despite the challenges of the global COVID-19 pandemic, to capture the profile of the mask industry for the period of July 2019 through June 2020. The eBeam Initiative’s sixth Mask Makers Survey in 2020 covers a number of questions related to the profile of the mask industry, from overall number of masks to pattern generation type. The survey respondents – 10 different captive and merchant photomask manufacturers versus those who participated in last year’s survey – reported 558,834 masks this year. Among the results of the Mask Makers survey, the number of masks written with multi-beam writers more than doubled versus last year’s survey, while the average mask write time reported using multi-beam writers (which was recorded for the first time in this year’s survey) was 12.14 hours. In addition, EUV mask yield was reported at 91 percent. The use of mask process correction (MPC) increased at leading-edge ground rules (nearly tripling for sub- 16-nm ground rules). The eBeam Initiative also conducts an annual survey of industry luminaries which can be found at www.ebeam.org.
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