Paper
15 March 2016 Firefly: an optical lithographic system for the fabrication of holographic security labels
Author Affiliations +
Abstract
This paper introduces Firefly, an optical lithography origination system that has been developed to produce holographic masters of high quality. This mask-less lithography system has a resolution of 418 nm half-pitch, and generates holographic masters with the optical characteristics required for security applications of level 1 (visual verification), level 2 (pocket reader verification) and level 3 (forensic verification). The holographic master constitutes the main core of the manufacturing process of security holographic labels used for the authentication of products and documents worldwide. Additionally, the Firefly is equipped with a software tool that allows for the hologram design from graphic formats stored in bitmaps. The software is capable of generating and configuring basic optical effects such as animation and color, as well as effects of high complexity such as Fresnel lenses, engraves and encrypted images, among others. The Firefly technology gathers together optical lithography, digital image processing and the most advanced control systems, making possible a competitive equipment that challenges the best technologies in the industry of holographic generation around the world. In this paper, a general description of the origination system is provided as well as some examples of its capabilities.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jorge Calderón, Oscar Rincón, Ricardo Amézquita, Iván Pulido, Sebastián Amézquita, Andrés Bernal, Luis Romero, and Viviana Agudelo "Firefly: an optical lithographic system for the fabrication of holographic security labels", Proc. SPIE 9780, Optical Microlithography XXIX, 97800U (15 March 2016); https://doi.org/10.1117/12.2218019
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KEYWORDS
Holography

Holograms

Spatial light modulators

Information security

Photoresist materials

Lithography

Optical lithography

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