Influence of bilayer resist processing on p-i-n OLEDs: towards multicolor photolithographic structuring of organic displays

Simonas Krotkus; Frederik Nehm; Robby Janneck; Shrujan Kalkura; Alex A. Zakhidov; Matthias Schober; Olaf R. Hild; Daniel Kasemann; Simone Hofmann; Karl Leo; Sebastian Reineke

doi:10.1117/12.2080174

16 March 2015 Influence of bilayer resist processing on p-i-n OLEDs: towards multicolor photolithographic structuring of organic displays

Simonas Krotkus, Frederik Nehm, Robby Janneck, Shrujan Kalkura, Alex A. Zakhidov, Matthias Schober, Olaf R. Hild, Daniel Kasemann, Simone Hofmann, Karl Leo, Sebastian Reineke

Author Affiliations +

Proceedings Volume 9360, Organic Photonic Materials and Devices XVII; 93600W (2015) https://doi.org/10.1117/12.2080174
Event: SPIE OPTO, 2015, San Francisco, California, United States

Abstract

Recently, bilayer resist processing combined with development in hydrofluoroether (HFE) solvents has been shown to enable single color structuring of vacuum-deposited state-of-the-art organic light-emitting diodes (OLED). In this work, we focus on further steps required to achieve multicolor structuring of p-i-n OLEDs using a bilayer resist approach. We show that the green phosphorescent OLED stack is undamaged after lift-off in HFEs, which is a necessary step in order to achieve RGB pixel array structured by means of photolithography. Furthermore, we investigate the influence of both, double resist processing on red OLEDs and exposure of the devices to ambient conditions, on the basis of the electrical, optical and lifetime parameters of the devices. Additionally, water vapor transmission rates of single and bilayer system are evaluated with thin Ca film conductance test. We conclude that diffusion of propylene glycol methyl ether acetate (PGMEA) through the fluoropolymer film is the main mechanism behind OLED degradation observed after bilayer processing.

Citation Download Citation

Simonas Krotkus, Frederik Nehm, Robby Janneck, Shrujan Kalkura, Alex A. Zakhidov, Matthias Schober, Olaf R. Hild, Daniel Kasemann, Simone Hofmann, Karl Leo, and Sebastian Reineke "Influence of bilayer resist processing on p-i-n OLEDs: towards multicolor photolithographic structuring of organic displays", Proc. SPIE 9360, Organic Photonic Materials and Devices XVII, 93600W (16 March 2015); https://doi.org/10.1117/12.2080174

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available