Paper
1 August 1990 Further studies on thermal aspects of inclusion-dominated processes in laser-induced thin film damage
Arthur H. Guenther, John K. McIver
Author Affiliations +
Proceedings Volume 1270, Optical Thin Films and Applications; (1990) https://doi.org/10.1117/12.20365
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands
Abstract
The inclusion dominated model of laser-induced damage is reexamined in order to explore the consequences of recent measured low values of thin film thermal conductivities. In the model absorption of radiation is assumed to only occur in the inclusion via Mie scattering. From the analysis two different values of the imaginary part of the index of refraction are predicted for a given damage threshold. Physical mechanisms are proposed for each value. Interestingly, varying the thermal conductivity of the both the host and inclusion over several orders of magnitude seem to have a less than expected influence on the damage threshold. However there is also proposed an effect of the index of refraction associated with a given damage threshold which is based upon two distinct absorption mechanisms. The results of this modified model are then compared with experimental data for damage thresholds of different thickness films.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Arthur H. Guenther and John K. McIver "Further studies on thermal aspects of inclusion-dominated processes in laser-induced thin film damage", Proc. SPIE 1270, Optical Thin Films and Applications, (1 August 1990); https://doi.org/10.1117/12.20365
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Cited by 6 scholarly publications.
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KEYWORDS
Laser damage threshold

Absorption

Thin films

Refraction

Laser induced damage

Data modeling

Pulsed laser operation

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