Recent development of low-voltage reactive-ion-plating deposition of optical thin films in China

Liying Han; Jiancun Gao; Jianchen Wang

doi:10.1117/12.144124

11 May 1993 Recent development of low-voltage reactive-ion-plating deposition of optical thin films in China

Liying Han, Jiancun Gao, Jianchen Wang

Proceedings Volume 1979, 1992 International Conference on Lasers and Optoelectronics; (1993) https://doi.org/10.1117/12.144124
Event: 1992 International Conference on Lasers and Optoelectronics, 1992, Bejing, China

Abstract

Various optical thin films of metal oxides and ITO have been deposited by low voltage reactive ion plating technique. Analysis of the resulting thin films shows that their microstructures are evidently improved.

Citation Download Citation

Liying Han, Jiancun Gao, and Jianchen Wang "Recent development of low-voltage reactive-ion-plating deposition of optical thin films in China", Proc. SPIE 1979, 1992 International Conference on Lasers and Optoelectronics, (11 May 1993); https://doi.org/10.1117/12.144124

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