Issue 15, 2023
From the journal:

Green Chemistry

Towards environmentally friendly processing of ionic liquid-based photoresists with a boosted lithography performance†

Lifei Liu,ab   Kuntong Song,ab   Tong Feng,ae   Ting Song,ab   Jintong Li,ab   Shangqing Chen,ab   Weizhen Zhao ORCID logo *abc  and  Suojiang Zhang ORCID logo *acd  

* Corresponding authors

a Beijing Key Laboratory of Ionic Liquids Clean Process, CAS Key Laboratory of Green Process and Engineering; State Key Laboratory of Multiphase Complex Systems, Institute of Process Engineering, Chinese Academy of Sciences, Beijing 100190, P. R. China
E-mail: sjzhang@ipe.ac.cn, wzzhao@ipe.ac.cn

b School of Chemical Engineering, University of Chinese Academy of Sciences, Beijing 100049, P. R. China

c Innovation Academy for Green Manufacture, Institute of Process Engineering, Chinese Academy of Sciences, Beijing 100190, P. R. China

d Longzihu New Energy Laboratory, Zhengzhou Institute of Emerging Industrial Technology, Henan University, Zhengzhou 450000, P. R. China

e Henan Key Laboratory of Polyoxometalate Chemistry, College of Chemistry and Chemical Engineering, Henan University, Kaifeng, Henan 475004, P.R. China

Abstract

The development of a sustainable process for producing high-performance photoresists is desirable yet challenging. In this study, we proposed an ionic liquid (IL)-assisted approach for preparing a photoresist by copolymerizing 1-butyl-3-vinyl imidazolium bromide (VBIMBr) and acrylates. The hydrophilic nature of VBIMBr improved the adhesion between the photoresist and the hydrophilic Si substrate, eliminating the use of hazardous hexamethyldisilazane (HMDS) vapor. This IL-based photoresist could be developed with water instead of the corrosive developer tetramethylammonium hydroxide (TMAH). Furthermore, the interaction between VBMIBr and H+ effectively reduced acid diffusion and line edge roughness (LER), resulting in superior lithography performance compared to traditional acrylate photoresists. This IL-based photoresist exhibited an excellent response to both deep ultraviolet lithography (DUV) and electron beam lithography (EBL), achieving a line resolution of 0.5 μm and 100 nm, respectively. Meanwhile, the lithography kinetics and mechanism were further investigated. Overall, this eco-friendly IL-assisted strategy provides a promising solution for producing high-performance photoresists, even in electrical applications. Additionally, this IL-assisted approach has the potential for widespread use in the development of advanced materials.

Graphical abstract: Towards environmentally friendly processing of ionic liquid-based photoresists with a boosted lithography performance

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Article information

DOI
https://doi.org/10.1039/D3GC01520C
Article type
Paper
Submitted
08 May 2023
Accepted
04 Jul 2023
First published
05 Jul 2023

Green Chem., 2023,25, 5989-5998

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Towards environmentally friendly processing of ionic liquid-based photoresists with a boosted lithography performance

L. Liu, K. Song, T. Feng, T. Song, J. Li, S. Chen, W. Zhao and S. Zhang, Green Chem., 2023, 25, 5989 DOI: 10.1039/D3GC01520C

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