Issue 2, 2012
From the journal:

Soft Matter

Spontaneous nanoscale polymer solution patterning using solvent evaporation driven double-dewetting edge lithography†

Kwang-Ho Lee,a   Sang-Mook Kim,b   Huisu Jeonga  and  Gun-Young Jung*a  

* Corresponding authors

a School of Materials Science and Engineering, Gwangju Institute of Science and Technology (GIST), 261 Cheomdan-gwagiro, Buk-gu Gwangju, South Korea
E-mail: gyjung@gist.ac.kr
Fax: +82-62-715-2304
Tel: +82-62-715-2324

b Korea Photonics Technology Institute (KOPTI), ChumDan 4-ro 5, Buk-gu Gwangju, South Korea
Fax: +82-62-605-9200
Tel: +82-62-605-9200

Abstract

We develop an innovative solution processable edge lithography, which we call double-dewetting edge lithography (DDEL). The polymer solution spontaneously dewets the hydrophobic regions and covers only hydrophilic regions on a surface energy-engineered substrate, which is achieved by a combination of conventional photolithography and a subsequent hydrophobic treatment of the exposed areas. Then, the secondary dewetting occurs through a coffee stain effect during the solvent evaporation, leaving polymer edge patterns behind. The whole double-dewetting phenomenon is complete within 1 s. This technique is a fast, cost-effective and easy direct solution patterning method, which enables nanoscale polymer edge patterns to be produced from various micron-scale platforms including lines, angular and irregular shapes.

Graphical abstract: Spontaneous nanoscale polymer solution patterning using solvent evaporation driven double-dewetting edge lithography

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Article information

DOI
https://doi.org/10.1039/C1SM06431B
Article type
Paper
Submitted
27 Jul 2011
Accepted
21 Sep 2011
First published
31 Oct 2011

Soft Matter, 2012,8, 465-471

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Spontaneous nanoscale polymer solution patterning using solvent evaporation driven double-dewetting edge lithography

K. Lee, S. Kim, H. Jeong and G. Jung, Soft Matter, 2012, 8, 465 DOI: 10.1039/C1SM06431B

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