A capacitively coupled microplasma (CCµP) formed in a channel in a quartz wafer

Adam Bass; Conrad Chevalier; M. W. Blades

doi:10.1039/B103507J

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Adam Bass,^a Conrad Chevalier^a and M. W. Blades*^a

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^a Department of Chemistry, 2036 Main Mall, University of British Columbia, Vancouver BC, Canada

Abstract

An optical emission plasma source with dimensions as small as 0.25 × 0.25 × 5 mm has been implemented on a quartz wafer. The He plasma, formed using a parallel plate, capacitively coupled geometry, operates at atmospheric pressure, uses a 13.56 MHz power source at 5–25 W, with gas flows between 17–150 mL min⁻¹, and is self-igniting. Parallel-plate capacitive power coupling is nearly ideal for generating and sustaining a plasma discharge “on a chip” since it can be implemented using a very simple electrode structure and does not require tuned or resonant structures.

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Article information

DOI: https://doi.org/10.1039/B103507J
Article type: Communication
Submitted: 19 Apr 2001
Accepted: 13 Jun 2001
First published: 26 Jun 2001

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J. Anal. At. Spectrom., 2001,16, 919-921

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