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Pulsed light sintering of nanomaterial interconnects embedded inside molded PDMS
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Joshi, Mukund Rajeev. Pulsed light sintering of nanomaterial interconnects embedded inside molded PDMS. Retrieved from https://doi.org/doi:10.7282/t3-6khf-zf12

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TitlePulsed light sintering of nanomaterial interconnects embedded inside molded PDMS
NameJoshi, Mukund Rajeev (author); Malhotra, Rajiv (chair); Pelegri, ASSIMINA (internal member); Mazzeo, Aaron (internal member); Rutgers University; School of Graduate Studies
Date Created2019
Other Date2019-05 (degree)
SubjectIPL, Mechanical and Aerospace Engineering, Polydimethylsiloxane, Photonic sintering, Flexible electronics
Extent1 online resource (viii, 74 pages) : illustrations
DescriptionThe need for flexible interconnects embedded inside elastomers is on the rise since the past few decades. This research explores how Intense Pulsed Light (IPL) sintering of interconnects consisting of Ag nanoflake-nanowire mixtures inside PDMS affects the electrical resistivity of the interconnect. Aerosol Jet Printing (AJP) was used to print the nanomaterial onto flexible PDMS substrates. The nanomaterial was encased by molding another layer of PDMS on top of it. IPL sintering was performed on the interconnect before and after molding the top PDMS layer, in two separate approaches. The IPL parameters and the nanoflake-nanowire ratio were varied to study their effect on sample quality. The fabricated samples were subjected to cyclic bending tests up to 1000 cycles. It is shown that there is an optimal fabrication route, with optimal IPL parameters and nanoflake-nanowire ratio that allows resistivity of around 9.75 - 11 µΩ-cm, with low hysteresis over 1000 cycles.
NoteM.S.
NoteIncludes bibliographical references
Genretheses, ETD graduate
Persistent URLhttps://doi.org/doi:10.7282/t3-6khf-zf12
LanguageEnglish
CollectionSchool of Graduate Studies Electronic Theses and Dissertations
Organization NameRutgers, The State University of New Jersey
RightsThe author owns the copyright to this work.
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