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Degradation of CVD-grown MoS2 subjected to DC electrical stress

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Abstract

Devices containing transition metal dichalcogenides are being investigated for next generation electronics. Understanding material properties under typical use conditions is important for the longevity and effectiveness of these devices. In this study, CVD-grown MoS2 crystals with pre-existing defects from the growth process were subjected to DC-voltages of 10 V, 20 V, and 40 V for up to 96 h. The presence of pre-existing defects was found to lead to more extensive material damage that scales with voltage and time. SEM, AFM, Raman and photoluminescence imaging indicated regions of increased defect concentration post-electrical stress.

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Acknowledgments

We gratefully acknowledge Nuwan H. Attanayake at NREL for the MoS2 material and Jason Holm at NIST for SEM assistance. D. Goggin performed this work as part of a National Research Council postdoctoral fellowship at NIST.

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Correspondence to Elisabeth Mansfield.

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Certain commercial equipment, instruments, or materials are identified in this paper to specify the experimental procedure adequately. Such identification is not intended to imply recommendation or endorsement by NIST, nor is it intended to imply that the materials or equipment identified are necessarily the best available for the purpose. The authors declare no competing financial interests.

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Mansfield, E., Goggin, D., Killgore, J. et al. Degradation of CVD-grown MoS2 subjected to DC electrical stress. MRS Communications 12, 878–885 (2022). https://doi.org/10.1557/s43579-022-00261-x

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  • DOI: https://doi.org/10.1557/s43579-022-00261-x

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