Deposition of magnesium silicide nanoparticles by the combination of vacuum evaporation and hydrogen plasma treatment

Jiri Stuchlik; The Ha Stuchlikova; Anna Artemenko; Zdenek Remes

doi:10.56646/jjapcp.3.0_011301

International Conference and Summer School on Advanced Silicide Technology 2014

Session ID : 011301

DOI https://doi.org/10.56646/jjapcp.3.0_011301

Conference information

Host: The Japan Society of Applied Physics

Name : International Conference and Summer School on Advanced Silicide Technology 2014

Location : Tokyo, Japan

Date : July 19, 2014 - July 21, 2014

Nanostructures

Deposition of magnesium silicide nanoparticles by the combination of vacuum evaporation and hydrogen plasma treatment

Jiri Stuchlik, The Ha Stuchlikova, Anna Artemenko, Zdenek Remes

Author information

CONFERENCE PROCEEDINGS OPEN ACCESS

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Abstract

The radio frequency plasma enhanced chemical vapor deposition (PECVD) of the hydrogenated amorphous silicon (a-Si:H) combined with the vacuum evaporation of magnesium followed by the hydrogen plasma treatment has been successfully applied for the in-situ deposition of magnesium silicide nanoparticles embedded in hydrogenated amorphous silicon thin layers. The homogeneous coverage of a-Si:H surface by magnesium silicide nanoparticles with diameter below 10 nm has been confirmed by the scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS).

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