[S-I-3-4] Evaluation of Thin SiO2 Layers by Beam Assisted Scanning Tunneling Microscope

Seiji Heike, Yasuo Wada, Seiichi Kondo, Mark Lutwyche, Ken Murayama, Hiroshi Kuroda (1.Advanced Research Laboratory, Hitachi, Ltd., 2.Technical Research Laboratory, Research and Development Division, Hitachi Construction Machinery Co., Ltd.)

https://doi.org/10.7567/SSDM.1994.S-I-3-4