Subnanopore structural change of time-elapsed silica PECVD films elucidated by slow positron annihilation and ellipsometric porosimetry

Shigeru Yoshimoto; Kenji Ito; Hiroyuki Hosomi; Masaaki Takeda; Toshinori Tsuru

doi:10.56646/jjapcp.7.0_011205

3rd China-Japan Joint Workshop on Positron Science (JWPS2017)

Session ID : 011205

DOI https://doi.org/10.56646/jjapcp.7.0_011205

Conference information

Host: The organizing committee of JWPS2017

Name : 3rd China-Japan Joint Workshop on Positron Science (JWPS2017)

Location : Hefei, China

Date : June 08, 2017 - June 10, 2017

Polymers, membranes, and porous media

Subnanopore structural change of time-elapsed silica PECVD films elucidated by slow positron annihilation and ellipsometric porosimetry

Shigeru Yoshimoto, Kenji Ito, Hiroyuki Hosomi, Masaaki Takeda, Toshinori Tsuru

Author information

CONFERENCE PROCEEDINGS OPEN ACCESS

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Abstract

To examine the effect of elapsed time on the nanoporosity, subnanoporous silica thin films, fabricated by plasma-enhanced chemical vapor deposition (PECVD), were investigated by means of low-energy positron annihilation lifetime spectroscopy and vapor-adsorption ellipsometric porosimetry. The structural change of the subnanoscaled pores was elucidated by comparison of the as deposited and 6-month-old films. It is expected that the change in the subnanoscaled pores of the present films, after exposure to air for half a year, is due to the adsorption of water molecules from air, followed by the filling up the nanoscaled pores as well as partial polycondensations between silanol groups at the silica grain boundaries of the films.

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