Position-Controlled Direct Graphene Synthesis on Silicon Oxide Surfaces Using Laser Irradiation

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Published 24 September 2013 Copyright (c) 2013 The Japan Society of Applied Physics
, , Citation Keisuke Koshida et al 2013 Appl. Phys. Express 6 105101 DOI 10.7567/APEX.6.105101

1882-0786/6/10/105101

Abstract

We have demonstrated a simple method of directly synthesizing graphene on dielectric surfaces using laser irradiation without a carbon source gas. The position of the graphene synthesis was precisely controlled. Moreover, channels were formed during graphene synthesis by scanning the laser beam across the substrate. The resulting device showed typical ambipolar transport behavior, which indicates that the channel consisted of graphene and that the device acted as a field-effect transistor (FET). Our laser irradiation technique does not require transfer processes and carbon source gases, and is a promising method for graphene synthesis and fabricating graphene FETs.

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10.7567/APEX.6.105101