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  • 學位論文

在玻璃基板上以水溶液法生長氧化鋅奈米柱膜

Growth of ZnO Nanorod Film on Glass by Aqueous Solution Deposition

指導教授 : 李明逵
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摘要


透明、高電子遷移率薄膜電晶體是先進顯示器發展之關鍵,因其透明則亮度高,可以低功率操作,因電子遷移率高反應速度快,可供高解析度顯示器使用,近年來迅速發展之金屬氧化物如氧化鋅(ZnO)可滿足這些要求。 在本論文中,以水溶液沉積法於玻璃基板上生長氧化鋅奈米柱陣列並使其合併成氧化鋅奈米柱薄膜,由於玻璃基板上氧化鋅奈米柱間之間距較大,相較於氮化鎵基板或藍寶石基板較不易聚合成膜,於是加入硝酸增加柱徑大小,提高柱間之合併程度,始於玻璃基板上成功生長氧化鋅奈米柱膜,且測量出霍爾電子移動率 6 cm2/V-s,發展具前瞻性之氧化鋅奈米柱薄膜電晶體(ZnO TFTs)。

並列摘要


Transparent and high electron mobility thin film transistor (TFT) is the key technology for modern displays. The transparency can enhance the brightness of display at lower operated power. The high electron mobility can enhance the switching speed and resolution. Metal oxides, for example zinc oxide (ZnO) can meet those requirements. In this study, we grow ZnO nanorod array and transform into ZnO nanorod film on glass substrate by aqueous solution deposition (ASD). However, ZnO nanorod array cannot be transformed into ZnO nanorod film easily due to larger lattice mismatch and the larger gap between ZnO nanorod than those of ZnO nanorod array on GaN or sapphire substrates. ZnO nanorod array transformed to ZnO nanorod film is obtained by incorporating with nitric acid (HNO3) solution to increase the size of nanorods and enhance the merge of ZnO nanorods on glass substrate and it exhibits electron Hall mobility of 6 cm2/V-s. We can obtain a high quality ZnO nanorod film transformed from arrays and it is suitable for fabricate ZnO TFTs.

參考文獻


[1] Junghwan Kim, JunMeng, Donghoon Lee, Meng Yu, Dukyean Yoo, DooWon Kang, and Jungyol Jo,”ZnO Thin-Film Transistor Grown by rf Sputtering Using Carbon Dioxide and Substrate Bias Modulation,” Journal of Nanomaterials Vol. 2014, Article ID 709018, pp.1-7.
References
Chapter 1
[2] John F. Conley, “Instabilities in Amorphous Oxide Semiconductor Thin-Film Transistors”, IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, Vol. 10, PP.460-474, 2010.
[3] Jin-Seong Park, Jae Kyeong Jeong, Yeon-Gon Mo, and Hye Dong Kim, “Improvements in the device characteristics of amorphous indium gallium zinc oxide thin-film transistors by Ar plasma treatment”, APPLIED PHYSICS LETTERS, Vol. 90, PP. 262106-1-262106-3, 2007.

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