本研究探討含氟壓克力單體製作疏水薄膜。利用甲基丙烯酸三氟乙酯(2,2,2- trifluoroethyl methacrylate, TFEMA),進行UV光聚合,測量薄膜疏水性變化。未添加含氟單體薄膜疏水角度為79.9°(標準差1.7度),添加20 wt. %後則上升至112.1°(標準差3.6度),但甲基丙烯酸三氟乙酯添加量20 wt.%以上接觸角疏水性未見差異。 於此亦探討表面粗糙度改變對疏水性影響,表面粗糙度由三種不同方法製作:溶劑、粉末添加、複印。薄膜表面因溶劑揮發而產生孔洞結構,溶劑揮發速率不同薄膜疏水性也改變。添加不同粒徑二氧化矽粉末製作粗糙表面,其接觸角為125.7°(標準差3.6度)。複印法利用矽晶片進行蝕刻,不同濃度及時間蝕刻矽晶片表面粗糙度變化相異,矽晶片蝕刻效果其接觸角由34.8°(標準差3.7度)上升至82.0°(標準差3.0度),利用複印粗糙度,改變粗糙度亦影響疏水性,利用複印而成的母模進行複印表面粗糙結構,接觸角約為117.6°(標準差1.7度)。
The preparation of the photo-polymerized stain resistant acrylic coating is studied using Fourier transformed infrared spectroscopy, contact angle measurement, gel permeation chromatography, and scanning electron microscopy. The addition of 2,2,2- trifluoroethyl methacrylate (TFEMA) can effectively increase the water contact angle of the acrylic coating from 79.9° (? =1.7°) to 112.1° (? =3.6°) but few differences of hydrophobic behaviors are found in the coatings containing TFEMA more that 20 wt.%. The effect of surface roughness, prepared by changing solvent evaporation rates, adding silica with different particle sizes, and micro-imprinting, on the hydrophobic property of the acrylic coating is also studied. The evaporation rate can affect the contact angle of the acrylic films by changing the porosity of the surface. The addition of a proper size and amount of silicas would significantly increase the surface roughness and then increase the water contact angle to 125.7° (? =3.6°). The template of micro-imprinting with different surface structures is prepared by etching silicone wafers at various conditions. The water contact angle of the wafer can drastically increase from 34.8° (? =3.7°) to 82.0° (? =3.0°) after the etching. A fine replica of the etched wafer surface can be obtained on the surface of the acrylic coatings.