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  • 學位論文

伺服系統對立體探針掃描微影之影響

Effects of SPM Servo on the Stereo Lithography

指導教授 : 顏家鈺

摘要


本文藉由刮掉試片表面提出3維的掃描式探針顯微鏡微影。之前的研究已經證明伺服控制器對微影有重要的影響,一個好的控制器可以得到一個均勻而且更為工整的微影記號。本篇研究利用對於壓電圓管的三維閉迴路控制來達到顯微鏡微影的效果,以各種演算法對於試片做出線、面以及角椎狀的微影加工。本篇研究也指出當連續微影時能夠觀察到許多未預料到的影響,試片表面上的材料受到探針的推擠而上升成犁狀形狀的邊緣,而這些經過加工後的碎削,如果只有經過一次的微影,並不易清除,但若能夠重複微影則可使大量的碎削被帶離加工區域。此外,我們也引入Mu合成控制器,在設計過程我們可以看到其整體的結果表現,實驗結果符合這些設計規格。

並列摘要


This paper addresses the three-dimensional scanning probe microscopy (SPM). The previous research has shown that the servo controller imposes significant effect on the lithography. A good controller enables a uniform and precise lithography pattern. This research, as a continuation to the previous work, achieved three-degree-of-freedom control of the SPM PZT driver and was able to scratch various patterns on the sample such as lines, flats and pyramids with different algorithms. This research also demonstrated that many unexpected effect could be observed when conducting continuous marking. The debris piles up on the sides of the plow mark and is very difficult to clean. It is also demonstrated that cleaning the debris by repetitively scratching the surface is possible. In addition, the design procedure for a Mu-synthesis controller is also presented to achieve desired performance. The experimental results confirm the design specifications.

並列關鍵字

AFM SPM Lithography Mu synthesis

參考文獻


[2] Guangyong Li, Ning Xi, Mengmeng Yu, Wai Keung Fung. “3-D Nanomanipulation using atomic force microscopy.” Proceedings of the 2003 IEEE International Conference on Robotics & Automation Taipei, Taiwan, September 14-19, 2003.
[3] T. Junno, K. Deppert, L. Montelius, and L. Samuelson.”Controlled manipulation of nanoparticles with an atomic force microscope.” Appl. Phys. Lett., Vol. 66 (26), 26 June 1995.
[6] Versen, M., B. Klehn, U. Kunze, D. Reuter and A.D. Wieck, “Nanoscale devices fabricated by direct machining of GaAs with an atomic force microscope,” Ultramicroscopy, Vol.82, pp.159-163, 2000.
[7] Kunze, U and B. Klehn, “Nanolithography with an AFM by means of vector-scan controlled dynamic plowing,” J. Appl. Phys., Vol.85, pp.3897,1999.
[8] Fang, T-H., C-I Weng and J-G Chang, “Machining characterization of the nano-lithography process using atomic force microscopy,” Nanotechnology, Vol.11, pp.181-187,2000.

被引用紀錄


張旭佑(2007)。以高速伺服提升原子力顯微鏡之奈米加工性能〔碩士論文,國立臺灣大學〕。華藝線上圖書館。https://doi.org/10.6342/NTU.2007.00878

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