The production of polysilicon based on the decomposition of silane relies on complex processes. There are several competing mechanisms active simultaneously during the production process, and detailed process control is crucial in order to actively enhance purity and homogeneity and suppress unwanted hydrogen content, porosity and fines formation, in addition to gaseous residuals in the exhaust. The proposed reactor layouts for silane-based silicon production, including Siemens, Fludized Bed (FBR) or Centrifuge Chemical Vapor Deposition Reactors (CCVDR) all have distinct advantages and disadvantages. At IFE we currently operate reactors based on three different layouts. In this presentation, we describe recent progress in determining the active mechanisms of silane decomposition in the Free Space Reactor (FSR), FBR and CCVDR.